The SSC-600 (6") Sputtering System incorporates upper and lower base plates for sputter up or sputter down operation. Substrates and stations are accessible from the top or bottom of the process chamber. Lower baseplate swings out for access through cabinet doors. Upper baseplate is elevated for substrate access and may be rotated outward for station access.
The SSC-600 (6") Sputtering System incorporates upper and lower base plates for sputter up or sputter down operation. Substrates and stations are accessible from the top or bottom of the process chamber. Lower baseplate swings out for access through cabinet doors. Upper baseplate is elevated for substrate access and may be rotated outward for station access.